Influence of oxide thickness on nucleation and growth of copper on tantalum

  1. Radisic, A.
  2. Oskam, G.
  3. Searson, P.C.
Revue:
Journal of the Electrochemical Society

ISSN: 0013-4651

Année de publication: 2004

Volumen: 151

Número: 6

Type: Article

DOI: 10.1149/1.1738673 GOOGLE SCHOLAR