Energetics and kinetics of surface states at n-type silicon surfaces in aqueous fluoride solutions

  1. Oskam, G.
  2. Hoffmann, P.M.
  3. Schmidt, J.C.
  4. Searson, P.C.
Revue:
Journal of Physical Chemistry

ISSN: 0022-3654

Année de publication: 1996

Volumen: 100

Número: 5

Pages: 1801-1806

Type: Article

DOI: 10.1021/JP952129E GOOGLE SCHOLAR
La source de données: Scopus