Statistically representative metrology of nanoparticles via unsupervised machine learning of tem images

  1. Wen, H.
  2. Luna-Romera, J.M.
  3. Riquelme, J.C.
  4. Dwyer, C.
  5. Chang, S.L.Y.
Revista:
Nanomaterials

ISSN: 2079-4991

Any de publicació: 2021

Volum: 11

Número: 10

Tipus: Article

DOI: 10.3390/NANO11102706 GOOGLE SCHOLAR lock_openAccés obert editor