Statistically representative metrology of nanoparticles via unsupervised machine learning of tem images

  1. Wen, H.
  2. Luna-Romera, J.M.
  3. Riquelme, J.C.
  4. Dwyer, C.
  5. Chang, S.L.Y.
Revue:
Nanomaterials

ISSN: 2079-4991

Année de publication: 2021

Volumen: 11

Número: 10

Type: Article

DOI: 10.3390/NANO11102706 GOOGLE SCHOLAR lock_openAccès ouvert editor
La source de données: Scopus